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MilliporeSigma

715166

Sigma-Aldrich

Octadecylphosphonic acid

97%

Synonym(s):

n-Octadecylphosphonic acid, ODPA

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About This Item

Empirical Formula (Hill Notation):
C18H39O3P
CAS Number:
4724-47-4
Molecular Weight:
334.47
MDL number:
MFCD00015838
UNSPSC Code:
12352300
PubChem Substance ID:
329762947
NACRES:
NA.23

Key Documents

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Quality Level

200

assay

97%

form

crystals

mp

95-100 °C

SMILES string

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)

InChI key

FTMKAMVLFVRZQX-UHFFFAOYSA-N

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General description

Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.

Application

Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.

pictograms

Exclamation mark
GHS07

signalword

Warning

hcodes

H315,H319

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2

Storage Class

11 - Combustible Solids

wgk_germany

WGK 3

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Certificates of Analysis (COA)

Lot/Batch Number
BGBC2431V
BGBC1995V
BGBB8602
MKBJ8197V
MKBG5276V

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Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Modification of cupronickel alloy surface with octadecylphosphonic acid self-assembled films for improved corrosion resistance.
Mioc K, et al.
Corrosion Science, 134(10), 189-198 (2018)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
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