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Merck

767484

Sigma-Aldrich

Nickel

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

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크기 선택

제품정보 (DICE 배송 시 비용 별도)

실험식(Hill 표기법):
Ni
CAS 번호:
7440-02-0
Molecular Weight:
58.69
EC Number:
231-111-4
MDL number:
MFCD00011137
UNSPSC 코드:
11101706
PubChem Substance ID:
329767317
NACRES:
NA.23

주요 문서

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기술 서비스
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도움 문의
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도움 문의

Quality Level

100

분석

99.95% trace metals basis

양식

solid

반응 적합성

core: nickel

저항도

6.97 μΩ-cm, 20°C

직경 × 두께

2.00 in. × 0.25 in.

bp

2732 °C (lit.)

mp

1453 °C (lit.)

density

8.9 g/mL at 25 °C (lit.)

SMILES string

[Ni]

InChI

1S/Ni

InChI key

PXHVJJICTQNCMI-UHFFFAOYSA-N

관련 카테고리

애플리케이션

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

픽토그램

Health hazardExclamation mark
GHS08,GHS07

신호어

Danger

유해 및 위험 성명서

H317,H351,H372

Hazard Classifications

Carc. 2 - Skin Sens. 1 - STOT RE 1

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 2

Flash Point (°F)

Not applicable

Flash Point (°C)

Not applicable

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시험 성적서(COA)

Lot/Batch Number
MKCM2517
MKBN4024V

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