730734
Trimethylgallium
packaged for use in deposition systems
동의어(들):
Me3Ga, TMGa, TMG
크기 선택
제품정보 (DICE 배송 시 비용 별도)
Quality Level
양식
liquid
반응 적합성
core: gallium
bp
92.5 °C/760 mmHg (lit.)
mp
-15.8 °C (lit.)
density
1.132 g/mL at 25 °C
SMILES string
C[Ga](C)C
InChI
1S/3CH3.Ga/h3*1H3;
InChI key
XCZXGTMEAKBVPV-UHFFFAOYSA-N
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일반 설명
애플리케이션
- A precursor to synthesize β-gallium oxide (β-Ga₂O₃) thin films for high-power electronic devices, offering superior breakdown voltage and thermal stability.
- A precursor for epitaxial growth of gallium nitride (GaN) in blue LEDs and laser diodes, enabling high-brightness displays and optical communication systems.
- A component in colloidal quantum dot synthesis for tunable near-infrared LEDs in biomedical imaging and telecommunications.
- A source material for gallium arsenide (GaAs) layers in high-electron-mobility transistors (HEMTs), critical for 5G millimeter-wave amplifiers.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
보충제 위험성
Storage Class Code
4.2 - Pyrophoric and self-heating hazardous materials
WGK
WGK 3
문서
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.
