663301
Trimethylaluminum
packaged for use in deposition systems
동의어(들):
Aluminum trimethanide, TMA
크기 선택
제품정보 (DICE 배송 시 비용 별도)
vapor pressure
69.3 mmHg ( 60 °C)
Quality Level
설명
heat of vaporization: ~41.9 kJ/mol (Dimer)
양식
liquid
반응 적합성
core: aluminum
bp
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
mp
15 °C (lit.)
density
0.752 g/mL at 25 °C (lit.)
SMILES string
C[Al](C)C
InChI
1S/3CH3.Al/h3*1H3;
InChI key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
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일반 설명
애플리케이션
- A chemical vapor deposition precursor to fabricate PbSe quantum dot solids for optoelectronic devices.
- An aluminum precursor for the flame synthesis of alumina nanofibers.
- A reagent for efficient synthesis of allenes.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
보충제 위험성
Storage Class Code
4.2 - Pyrophoric and self-heating hazardous materials
WGK
nwg
Flash Point (°F)
No data available
Flash Point (°C)
No data available
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
문서
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
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