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A propos de cet article
Formule linéaire :
KOH
Numéro CAS:
Poids moléculaire :
56.11
PubChem Substance ID:
eCl@ss:
38100303
UNSPSC Code:
12352106
NACRES:
NA.21
EC Number:
215-181-3
MDL number:
Assay:
≥85%
Form:
pellets
Solubility:
water: soluble ((1,130 g/l (68 °F / 20 °C))
Service technique
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Laissez-nous vous aiderQuality Level
agency
USP/NF, reag. Ph. Eur.
vapor pressure
1 mmHg ( 719 °C)
assay
≥85%
form
pellets
impurities
≤2.0% K2CO3
pH
~13.5 (25 °C, 5.6 g/L)
mp
361 °C (lit.)
solubility
water: soluble ((1,130 g/l (68 °F / 20 °C))
anion traces
chloride (Cl-): ≤0.02%, phosphate (PO43-): ≤0.01%, sulfate (SO42-): ≤0.02%
cation traces
Al: ≤0.001%, Ca: ≤0.001%, Fe: ≤0.001%, Na: ≤1.0%, Ni: ≤0.0005%
SMILES string
[OH-].[K+]
InChI
1S/K.H2O/h;1H2/q+1;/p-1
InChI key
KWYUFKZDYYNOTN-UHFFFAOYSA-M
General description
Potassium hydroxide is a strong alkali that can be used in nucleophilic substitution reactions, addition reactions, and basic hydrolysis reactions. It can also be used to catalyze aldol-type reactions.
Application
Potassium hydroxide can be used as a base:
- In the Pd-catalyzed Heck reaction of aryl halides with alkenes.
- To synthesize β-alkylated alcohols via pincer-Ni catalyzed Guerbet reaction.
- For the hydroxylation of aryl or heteroarylboronic acids to corresponding phenols.
- Transesterification of triglycerides to prepare biodiesels.
- Synthesis of β-phenylethylamines via intermolecular addition of arylamines to styrenes.
- Claisen-Schmidt condensation reaction to synthesize chalcones.
Packaging
This product is also available in glass bottles.
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signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A
Classe de stockage
8A - Combustible corrosive hazardous materials
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
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Potassium hydroxide catalyzed addition of arylamines to styrenes
Jaspers D, et al.
Synlett, 2011, 1444-1448 (2011)
Novel CuCl2-cryptand-[2.2. Benzo] complex: A base free and oxidant free catalyst for Ipso-Hydroxylation of aryl/heteroaryl-boronic acids in water at room temperature
Bora S, et al.
Journal of Organometallic Chemistry, 851, 52-56 (2017)
Yuewang Huang et al.
Optics express, 23(5), 6780-6786 (2015-04-04)
We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is
Numéro d'article de commerce international
| Référence | GTIN |
|---|---|
| 30603-1KG | 04061826672716 |
| 30603-6X1KG | 04061826672730 |
| 30603-500G | 04061826672723 |
| 30603-5KG | 04061833458891 |

